RVP-300plus™
The RVP-300plus™ vertical batch furnace delivers superior process results and optimized throughput providing the lowest cost of ownership (CoO) for diffusion, oxidation and LPCVD applications for 300-mm wafers.
Production-proven performance
* Greater than 150 systems in production at major IC manufacturers worldwide
* Aviza’s fourth generation furnace leveraging the design expertise of approximately 2,500 production systems and 40 years of thermal technology experience
Superior process results targeting 90 nm and extendible to 65 nm
* Reduced defectivity delivered through improved process control utilizing a proprietary plenum and unique chamber design
* Improved uniformity achieved by Aviza’s industry-leading Advanced Temperature Control (ATC)
* Reduced thermal budget and optimized work-in-process (WIP) enabled by fast temperature ramping
* Process flexibility as a result of a wide array of films for LPCVD and in-situ doped applications
Low cost of ownership
* Industry’s highest throughput system delivered by
- A unique dual boat design reducing overhead time* Low consumable usage
- Large capacity wafer FOUP stocker
- In-situ cleaning capability
- Ability to operate in a continuous mode optimizing WIP
* Side-by-side configuration to minimize cleanroom footprint